| abstract |
PROBLEM TO BE SOLVED: To solve the above-mentioned problems, and an object of the present invention is to form a spacer having high rectangularity and roughness performance in lithography by the spacer method, and as a core material formed by the spacer method. Even when a high-temperature treatment is applied to the resist pattern (for example, when a high-temperature CVD method is applied to the resist pattern), it is difficult to obtain a deformed spacer, and as a result, an increase in process cost can be suppressed. A pattern forming method, an electronic device manufacturing method using the same, and an electronic device are provided. SOLUTION: (A) (A) Using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose polarity is increased by the action of an acid and its solubility in a developer containing an organic solvent decreases. (1) a step of exposing the first film; (c) developing the exposed first film with a developer containing an organic solvent; And (d) a pattern forming method including a step of forming a second film on the substrate so as to cover the periphery of the negative pattern, and an electron using the pattern forming method. Device manufacturing method and electronic device. [Selection figure] None |