http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009031350-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_273d8650c2c2f123e39c9e8d9c3119a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83107856499a80b6686496ee39f17cc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc7c3e7155aac42b3e1253dd35ff2cb9 |
| publicationDate | 2009-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009031350-A |
| titleOfInvention | Resist composition and resist pattern forming method |
| abstract | The present invention provides a resist composition and a resist pattern forming method capable of reducing the amount of coating solution when coated on a support and improving the uniformity of the thickness of a resist film. A resist composition comprising a resin component (A) whose solubility in an alkali developer is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, further comprising: Formula (G1-0) [wherein R f is a fluorinated alkyl group having 1 to 6 carbon atoms, and R 11 is an alkylene group having 1 to 5 carbon atoms or a single bond. ] The resist composition characterized by containing the fluorine-type surfactant (G1) which has the alkylene oxide chain containing group represented by these. [Chemical 1] [Selection figure] None |
| priorityDate | 2007-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 292.