| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate |
2006-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f110e0e7102931afe7edfc0254e94e54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1eef77014bdc868f00707a265aeb45a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25eac08c5fa328b123f8ee55d0d67a3f |
| publicationDate |
2008-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008052107-A |
| titleOfInvention |
Positive resist composition and pattern forming method using the same |
| abstract |
The present invention relates to a positive resist composition for manufacturing VLSI and high-capacity microchips and a pattern forming method using the same, and more particularly to a semiconductor device using KrF excimer laser light, electron beam or EUV light. Provided are a positive resist composition with improved development defect performance in microfabrication and a pattern forming method using the same. (A) a resin having a specific phenylalkylacrylate repeating unit and a hydroxystyrene repeating unit, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (F) a specific fluorine-based surfactant. Containing a positive resist composition and a pattern forming method using the same. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009031350-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015064605-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019214554-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017081990-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7190968-B2 |
| priorityDate |
2006-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |