| abstract |
(57) [Summary] [PROBLEMS] To solve the problem of microbubbles in a resist solution. SOLUTION: By adding a surfactant having a perfluoroalkyl ether group as a hydrophobic group, improvement in leveling property and prevention of generation of microbubbles can be achieved at the same time. A positive resist composition containing (A1) a base polymer for a photoresist, (B) an organic solvent, and (C) an acid generator in addition to the surfactant; And (A2) a base polymer for a photoresist, Provided is a negative resist composition comprising (B) an organic solvent, (C) an acid generator, and (D) a crosslinking agent. Further, the positive photoresist composition may contain (E) a basic compound and (F) a dissolution inhibitor, The negative photoresist composition can contain (E) a basic compound. |