| abstract |
A polymer compound comprising a repeating unit represented by the following general formula (1). (R 1 and R 2 are the same or different hydrogen atoms, or a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, together with the carbon atom to which R 1 and R 2 are bonded to each other. A ring may be formed, and R 30 is a hydrogen atom or a methyl group.) [Effect] According to the pattern forming method using the resist protective film material of the present invention, the resist protective film formed on the resist film is water-insoluble and can be dissolved in an alkaline aqueous solution (alkaline developer). Since it does not mix with the resist film, good immersion lithography can be performed, and development of the resist film and removal of the protective film can be simultaneously performed at the same time during alkali development. [Selection figure] None |