| abstract |
A resist protective film material comprising a polymer compound composed of repeating units represented by general formulas (1a), (1b), (2a), and (2b). (R 1a and R 1b are H or an alkyl group, R 2 is H, CH 3 or CF 3 , R 3 is H or an acid labile group, R 4a to R 4c are H or an alkyl group, and R 5 is an alkyl group. 0 <a1 <1, 0 ≦ a2 <1, 0 ≦ b1 <1, 0 ≦ b2 <1, 0 <a1 + a2 <1, 0 <b1 + b2 <1, 0 <a1 + a2 + b1 + b2 ≦ 1.) [Effect] The resist protective film material is excellent in water repellency and water slidability in immersion lithography, and can realize good lithography performance with few development defects. [Selection figure] None |