http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007264118-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2006-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50f4a97d049df833ff4c1ad182ea4d9a |
| publicationDate | 2007-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007264118-A |
| titleOfInvention | Resist composition, method for forming resist pattern, semiconductor device and method for manufacturing the same |
| abstract | [PROBLEMS] A wide range of selectable materials that can be used, high anti-static effect, high sensitivity, no missing pattern or misalignment, and high-resolution, fine resist pattern at low cost and simple Providing a resist composition that can be efficiently formed. A resist composition of the present invention includes at least a base resin having conductivity, a photoacid generator, a crosslinking agent, and an organic solvent. The resist pattern forming method of the present invention includes a resist film forming step of forming a resist film on a surface to be processed using the resist composition of the present invention, and an exposure step of selectively irradiating the resist film with exposure light. And a developing step for developing the pattern. The method for producing a semiconductor device of the present invention comprises a resist pattern forming step of forming a resist film on a surface to be processed using the resist composition of the present invention, and then exposing and developing to form a resist pattern; And a patterning step of patterning the surface to be processed by etching using a resist pattern as a mask. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015174453-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010106245-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100036968-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10488757-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101650572-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10049780-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11145432-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014185522-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015174453-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009259916-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102395397-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200040671-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014185522-A1 |
| priorityDate | 2006-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 174.