| abstract |
Photoresist compositions include conjugated resist additives, photoactive compounds, and polymer resins. The conjugated resist additive is one or more selected from the group consisting of polyacetylene, polythiophene, polyphenylenevinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline. Polyacetylene, polythiophene, polyphenylene vinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline are alkyl groups, ether groups, ester groups, alkene groups, aromatic groups, anthracene groups, alcohol groups, amine groups, carboxylic acids Group, and a substituent selected from the group consisting of amide groups. Other photoresist compositions include photoactive compounds and polymer resins having conjugated moieties. The conjugated moiety is one or more selected from the group consisting of polyacetylene, polythiophene, polyphenylenevinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline. |