| abstract |
The photoresist composition includes a conjugated resist additive, a photoactive compound, and a polymeric resin. The conjugated resist additive is at least one selected from the group consisting of polyacetylene, polythiophene, polyphenylenevinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline. Polyacetylene, polythiophene, polyphenylenevinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline are alkyl groups, ether groups, ester groups, alkene groups, aromatic groups, anthracene groups, alcohol groups, amine groups, carboxylic acids group, and a substituent selected from the group consisting of an amide group. Another photoresist composition comprises a photoactive compound and a polymeric resin having a conjugated moiety. The conjugated moiety is one or more selected from the group consisting of polyacetylene, polythiophene, polyphenylenevinylene, polyfluorene, polypyrrole, polyphenylene, and polyaniline. |