| abstract |
An object of the present invention is to provide a resist composition suitable for forming a fine pattern by an electron beam or an X-ray. A resist composition comprising an acid generator having a structure represented by the following formula (1) and a resin having a functional group capable of increasing solubility in alkali by the action of an acid, wherein the resist composition comprises: The resolution at the time of pattern formation is 90 nm or less. Embedded image In the above formula (1), R represents a monovalent organic group, a nitro group, a cyano group or a hydrogen atom having a fluorine content of 50% by weight or less, and Z 1 and Z 2 are each independently a fluorine atom or It represents a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms. [Selection diagram] None |