| abstract |
The present invention provides an actinic radiation-sensitive or radiation-sensitive resin composition, a photoacid generator, an actinic radiation-sensitive or radiation-sensitive film using these, a method for forming a pattern, and a method for manufacturing an electronic device. An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a photoacid generator that generates an acid with a pKa of -1.40 or more upon irradiation with actinic ray or radiation, and (B) a repeating acid-decomposable group-containing The resin of the unit, the Et h sensitivity of the repeating unit having the above-mentioned acid-decomposable group is an actinic radiation-sensitive or radiation-sensitive resin composition of 5.64 or less, especially when forming an ultrafine pattern, the roughness performance, exposure latitude and Focus margin is excellent. |