| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_74973199515dbabd2310245aab03e282 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2001-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ab864eb5c0cd9007b28e6cb1f6049cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_912c9649db252465a6ff27ca35987400 |
| publicationDate |
2003-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003151971-A |
| titleOfInvention |
Chamber cleaning method, film forming apparatus, and semiconductor device manufacturing method |
| abstract |
(57) [Problem] To improve the cleaning efficiency of a chamber cleaning method for generating plasma using a cleaning gas containing fluorine. SOLUTION: The chamber cleaning method according to the present invention is to supply a cleaning gas containing fluorine to the chamber (1), and to apply inductively coupled plasma to the chamber (1) while the cleaning gas is introduced into the chamber (1). ) And cleaning the chamber (1). The cleaning efficiency of the chamber (1) is improved by cleaning the chamber using the inductively coupled plasma of the cleaning gas containing fluorine. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110025142-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8574448-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005019852-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005001920-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005019853-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100433273-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999068-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4558284-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4558285-B2 |
| priorityDate |
2001-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |