http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005019853-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
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filingDate 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54f2b83a4e621366fedf43b1eb84c17f
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publicationDate 2005-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005019853-A
titleOfInvention Plasma cleaning method and substrate processing method
abstract Cleaning is performed by igniting plasma in a cleaning gas containing a halogen compound. A plasma is ignited by introducing a mixed gas of a rare gas and a halogen gas into a plasma generator at a pressure lower than a predetermined pressure used in a predetermined cleaning process. Thereafter, the pressure of the mixed gas is increased to the predetermined pressure. [Selection] Figure 8
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010262987-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2021085158-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010125995-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7257543-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016537824-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010199310-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008060304-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015221428-A
priorityDate 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.