| abstract |
[PROBLEMS] To provide a positive resist composition having a wide process window and improved dependency on density. SOLUTION: A positive resist composition comprising (A) a resin whose dissolution rate in an alkaline developer is increased by the action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation. A) As the resin, at least two acid-decomposable resins having different specific repeating unit contents are combined. |