| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate |
2004-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2a6564d37d593cb43a9d727ba2ef3bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa |
| publicationDate |
2006-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006133500-A |
| titleOfInvention |
Method for producing resist composition and resist composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a method for producing a resist composition capable of reducing defects and a resist composition. A method for producing a resist composition, comprising (A) a resin component whose alkali solubility is changed by the action of an acid, and (B) an acid generator component which generates an acid upon exposure, comprising the same type of composition A method for producing a resist composition comprising mixing a plurality of types of copolymers comprising units and having different contact angle measurement values to obtain component (A). [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4498939-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015083695-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006215068-A |
| priorityDate |
2004-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |