| abstract |
A photoresist composition having excellent resolution performance is provided. A unit containing at least one unit (a) having an acid labile group in the side chain and having a hydroxyl group (however, —OH of a carboxyl group is not considered a hydroxyl group) in the side chain ( A resin (A) containing at least one unit (b), having at least one unit (c) having a lactone structure in the side chain, and further having a unit having an oxoadamantane structure in the side chain, and an acid generator, A photoresist composition comprising: [Selection figure] None |