| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1987-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f86db98d10ff8f8a0057711c93cfa98b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9183b446c334d5f9dc712987625b19d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6941a58ed63f75592bcdf9eeb26497f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a09ead351dee53e8ec93ba7d621a72df |
| publicationDate |
1988-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0264908-A2 |
| titleOfInvention |
High sensitivity resists having autodecomposition temperatures greater than about 160 C |
| abstract |
The present invention relates to increasing the autodecomposition temperature of particular resists. The resists are comprised of structures having recurrent acid labile groups which are typically pendant to the polymeric backbone. The autodecomposition temperature of a resist is increased by selecting substituent sidechains on the acid labile group which exhibit increased stability. Sidechain structures which provide increased autodecomposition stability include secondary structures capable of forming secondary carbonium ion intermediates and having an available proton adjacent to the carbonium ion formed during cleavage. Moieties which can be used as the secondary sidechain structures include secondary alkyl, including both cyclic and alicyclic alkyl, substituted deactivated secondary benzyl, and substituted deactivated secondary heterocyclics. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5145764-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9115810-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9115808-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4985332-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5262281-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0366590-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0366590-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6010826-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5093221-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5252427-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5206317-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5212047-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5071731-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5558978-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0378156-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6309795-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5879852-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0378156-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5654121-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11698586-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5219711-A |
| priorityDate |
1986-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |