| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1992-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1993-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4ff39aeb5981581acc80b6a8eedd12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57a42ba32a03ee92a96f60ecfb904d21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d87a8df3c7ff2ca1dd1e6d68d1929e54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6e02cf2fef17f4929e11f5e0812782e |
| publicationDate |
1993-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5219711-A |
| titleOfInvention |
Positive image formation utilizing resist material with carbazole diazonium salt acid generator |
| abstract |
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile α-alkoxyalkyl carboxylic acid ester and/or hydroxyaromatic ether moieties in the presence of an acid generator comprising a novel diazonium salt. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6090526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5472826-A |
| priorityDate |
1990-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |