| abstract |
The invention relates to a method and device for large-area coating of substrates under atmospheric pressure conditions, the latter being understood to mean a pressure interval of ± 300 Pa around the respective ambient atmospheric pressure. The solution according to the invention is intended to be able to obtain coatings under atmospheric pressure conditions over large areas while at the same time avoiding the undesirable formation of particles. To achieve this object, a first gas stream is led into a plasma source, which drives plasma from a large-volume plasma out of the plasma source and the generated plasma through at least one slot nozzle or a plurality of nozzles onto a surface of the substrate to be coated, which is arranged within a sealed reaction chamber is, judges. The layer is formed directly on the surface of the substrate by a physico-chemical reaction of at least one component of a precursor. The precursor is a component of at least one second gas stream which is directed into the reaction chamber and into the area of influence of the plasma emerging from the plasma source. Furthermore, by adjusting the volume flows, the flow velocities and / or the flow directions of the plasma and the second gas flow, as well as the distance from nozzle openings for the plasma and a predeterminable internal pressure in the reaction chamber, it is ensured that the physico-chemical reaction to form the ... |