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filingDate 2014-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2015-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber DE-102014100385-A1
titleOfInvention Plasma coating method for depositing a functional layer and separator
abstract The invention relates to a plasma coating method for depositing a functional layer on a surface of a substrate and to an apparatus for carrying out the coating method. In order to provide a plasma coating process which enables high coating speeds and proceeds under normal atmospheric conditions, it is proposed according to the invention to use an atmospheric plasma and an inert carrier gas, so that on the one hand very high energies can be introduced into the coating material to initiate a chemical reaction, and on the other hand controllable chemical reaction in the absence of atmospheric oxygen in the plasma is made possible. The coating material for forming the functional layer is fed via a feed directly into the plasma generated in a nozzle in the absence of oxygen.
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