http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022202428-A1

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filingDate 2022-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5829a1d2914bc384a868ca4a3deb59fa
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publicationDate 2022-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2022202428-A1
titleOfInvention Cleaning method and plasma processing device
abstract In a specification step, the pressure within a processing container at the time of plasma cleaning is specified from the amount of damage to a protective film that is provided on an inner surface of the processing container and the cleaning rate at which accumulated matter that accumulates in the processing container is removed, said amount of damage and said cleaning rate being treated as plasma cleaning parameters. In a cleaning step, the pressure within the processing container is adjusted to the pressure that was specified in the specification step, while a cleaning gas is supplied into the processing container, and microwaves are used to generate plasma within the processing container and plasma cleaning is performed within the processing container.
priorityDate 2021-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.