| abstract |
The present invention is provided with an actinic-ray-sensitive or radiation-sensitive resin composition, a resist film, a pattern formation method, an electronic device manufacturing method, a compound, and a compound production method which are capable of obtaining a pattern excellent in LWR performance. This actinic-ray-sensitive or radiation-sensitive resin composition comprises a resin having a repeating unit having a group that is decomposed by action of acid to increase a polarity. The actinic-ray-sensitive or radiation-sensitive resin composition further comprises a compound having at least one cation represented by general formula (1), in addition to the resin; or the resin further has a repeating unit having the cation represented by general formula (1), in addition to the foregoing repeating unit. |