| abstract |
A resist composition containing a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, where the alicyclic group has an oxygen atom or a sulfur atom in the ring structure, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent. |