http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021100353-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6821349e83f8714103cf65b3fc17c317 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D17-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 |
| filingDate | 2020-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4e415d2029fa55893909029f7ad0dd8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e529bf95cf70a5efe2ae4926e3f351f |
| publicationDate | 2021-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021100353-A1 |
| titleOfInvention | Cleaning solution and cleaning method |
| abstract | The present invention addresses the problem of providing a cleaning solution that is for a semiconductor substrate subjected to chemical-mechanical polishing and that has excellent ability to prevent corrosion of metal film and excellent ability to inhibit defects in metal film. The present invention also addresses the problem of providing a method for cleaning a semiconductor substrate that has been subjected to chemical-mechanical polishing.　The cleaning solution according to the present invention is one that is for a semiconductor substrate subjected to chemical-mechanical polishing, and that contains a compound having an amine oxide compound which is a compound having an amine oxide group or a salt thereof, and at least one hydroxylamine compound selected from the group consisting of hydroxylamines, hydroxylamine derivatives, and salts thereof. The contained amount of the amine oxide compound is 0.00001-0.15 mass% with respect to the total mass of the cleaning solution. |
| priorityDate | 2019-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 398.