Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02491 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0237 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02381 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-452 |
filingDate |
2020-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1857abcfbe266dbf6da4d261a5a2fb1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f81ddceaa69cac5efcc957ed4b80163 |
publicationDate |
2021-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2021067118-A1 |
titleOfInvention |
Selective graphene deposition using remote plasma |
abstract |
Graphene is deposited on a metal surface of a substrate using a remote hydrogen plasma chemical vapor deposition technique. The graphene may be deposited at temperatures below 400C, which is suitable for semiconductor processing applications. Hydrogen radicals are generated in a remote plasma source located upstream of a reaction chamber, and hydrocarbon precursors are flowed into the reaction chamber downstream from the remote plasma source. The hydrocarbon precursors are activated by the hydrogen radicals under conditions to deposit graphene on the metal surface of the substrate in the reaction chamber. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11515163-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022216058-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11713248-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021206643-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023004329-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023287554-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023064016-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023004328-A1 |
priorityDate |
2019-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |