http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021002350-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_527d41cad118be2c39e19a33eab54468 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 |
| filingDate | 2020-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2f0cd4af41b5028c33af2a4d42079c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3963badabbaf9ee529bbd7354ad27d |
| publicationDate | 2021-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2021002350-A1 |
| titleOfInvention | Resist material and method for forming pattern |
| abstract | The present invention addresses the problem of forming a resist film which has high sensitivity and which enables high-definition patterning. The present invention relates to a resist material containing a polymer that includes units derived from a structure represented by general formula (101). In general formula (101): R1 each independently represent a hydrogen atom, an alkyl group which may have a substituent, an acyl group which may have a substituent, an allyl group which may have a substituent, an alkoxy group which may have a substituent, or an alkylsilyl group which may have a substituent, and a plurality of R1 may be the same or different; R11 represents a hydrogen atom or an alkyl group which may have a substituent; R2 represents a hydrogen atom, an alkyl group, a fluorine atom, a chlorine atom, a bromine atom, or a halogenated alkyl group; and Y1 represents a single bond or a linking group. |
| priorityDate | 2019-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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