| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-482
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02277 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 |
| filingDate |
2020-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fe70d300d4b161de56643205670ecd3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d707c09fd877ed9198a431eb45ef2e16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0307cb3cfa7249a240c29ff52c0039e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63763363480dad7161fd57316c557585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a18ab5e50774901e4ba4939b96225fb8 |
| publicationDate |
2020-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020213454-A1 |
| titleOfInvention |
Film formation method and film formation device |
| abstract |
This film formation method has: a step for adsorbing a precursor of a film-forming source gas onto the surface of a substrate by irradiating the inside of a processing container with ultraviolet light which has a first wavelength and separates a predetermined bonding of the source gas while supplying the source gas into the processing container in which a substrate on which a film is to be formed is disposed; and a step for forming a layer, in which the precursor and a reaction gas react on the surface of the substrate, by supplying the reaction gas into the processing container. |
| priorityDate |
2019-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |