| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2019-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f1d6c3b67ac17d2438d8a930101821f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f0a33c356d5d61335189d847330926
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fc1b958be16a1abc66d8bdf424bf85 |
| publicationDate |
2020-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020105523-A1 |
| titleOfInvention |
Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device |
| abstract |
The purpose of the present invention is to provide an active ray-sensitive or radiation-sensitive resin composition capable of forming a resist film having excellent post-exposure delay stability. Another purpose of the present invention is to provide: a resist film using the active ray-sensitive or radiation-sensitive resin composition; a pattern forming method; and a method for manufacturing an electronic device. This active ray-sensitive or radiation-sensitive resin composition is an active ray-sensitive or radiation-sensitive resin composition comprising: a resin X having a specific structure; a resin Y having a specific structure; a compound producing an acid by being irradiated with active rays or radiation; and a solvent. The receding contact angle, to water, of a film formed by using the active ray-sensitive or radiation-sensitive resin composition is 73° or greater. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023153296-A1 |
| priorityDate |
2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |