abstract |
A resist composition having high water repellency and capable of reducing the occurrence of defects, a resist pattern forming method using the resist composition, a fluorine-containing polymer compound useful as an additive for the resist composition, and the containing composition Provision of a compound useful for producing a fluorine polymer compound. A resist composition that generates an acid upon exposure and changes its solubility in a developer by the action of an acid, the substrate component (A) having a change in solubility in a developer by the action of an acid; A fluorine additive component (F) that exhibits decomposability to an alkali developer, and the fluorine additive component (F) is a structural unit derived from a compound represented by formula (f1-1) ( containing a fluorine resin component (F1) having f1), the resist composition (wherein, W is the .Rf 1 and Rf 2 is a polymerizable group-containing group are each independently hydrogen atom or an electron-withdrawing group .Rf 3 is a hydrocarbon group). [Selection figure] None |