| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb62a7f52dc2a00054baf6baa8ff77a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f1d6c3b67ac17d2438d8a930101821f |
| publicationDate |
2018-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2018043122-A1 |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic device |
| abstract |
The present invention addresses the problem of providing an actinic ray-sensitive or radiation-sensitive resin composition having excellent depth of focus (DOF). The present invention addresses the problem of also providing a resist film that uses the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for producing an electronic device. This actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin containing repeating units having a lactone structure or repeating units having a sultone structure; a photoacid generator for acid generation by exposure to actinic rays or radiation; and a compound represented by formula (1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7250425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020022088-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102451849-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020022088-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020022089-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020022089-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190109147-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018124548-A |
| priorityDate |
2016-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |