abstract |
(Project) Provision of a resist composition and a resist pattern formation method. (Solution Means) A resist composition comprising a base component (A) whose solubility in a developer changes due to the action of an acid, and an acid generator component (B) that generates an acid upon exposure, comprising: The base component (A) contains a polymer compound (A1) containing a structural unit (a1) having an acid-decomposable group, The structural unit (a1) having an acid-decomposable group is contained in an amount of 51 mol% to 59 mol% based on the total structural unit of the polymer compound (A1), The above problem is solved by providing a resist composition in which the structural unit (a1) having an acid-decomposable group contains a structural unit represented by the following formula (a1-1). [In formula (a1-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Z represents a single bond or an alkylene group; C p is (where R 1 is a tertiary alkyl group, n p is a positive integer, and * represents a bonding position with Z).] |