http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020022089-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2020022089-A1 |
| titleOfInvention | Sensitive light-sensitive or radiation-sensitive resin composition, sensitive light-sensitive or radiation-sensitive film, pattern forming method, manufacturing method of electronic device |
| abstract | The present invention includes two or more types of repeating units, and at least one of the above two or more types of repeating units is a fluorine atom, a silicon atom, or a linear or branched hydrocarbon having 6 or more carbon atoms. A photosensitive or radiation-sensitive resin composition containing a copolymer (P), which is a repeating unit having a group and satisfies a specific condition, and a photosensitizing or radiation-sensitive film using the same. A method for forming a pattern and a method for manufacturing an electronic device are provided. |
| priorityDate | 2018-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 179.