Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ff57144603c661f4b368824eae0729f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-3144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02161 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-359 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-118 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-118 |
filingDate |
2015-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e43c524dbc88bc08cf77e6f3229bcb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35a2026842692f6a026c58c7648e7a19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f67f86ee80014e0fa13226f4cbd3f59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_655f23116d8e01f005d55fd75652b898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1db3c935c3f285e472814aa193883cc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4d0d130f66c282e258060c2ebd10a92 |
publicationDate |
2016-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2016034187-A1 |
titleOfInvention |
A photodetector for use in spatially resolved spectroscopy applications |
abstract |
A photodetector for use in spatially resolved spectroscopy (SRS) applications, e. g. Tissue Oximetry for detection of weak diffuse light. The photodetector comprises a black silicon surface, made by maskless reactive ion etching (RIE). The specific microstructure topology of the black silicon provides a low reflectance for light incident at all angles and at the same time a high light conversion efficiency. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106997915-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110323286-A |
priorityDate |
2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |