| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5397fc5ff75ee49a454558b68b36baa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-0407 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-881
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-8605
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D1-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-86 |
| filingDate |
2003-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26b45d7629e761d3b4f860985e31aa38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37fdd7c8f32e54fe63e96e4ff420980a |
| publicationDate |
2004-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1400330-A1 |
| titleOfInvention |
Method and apparatus for forming high surface area material films and membranes |
| abstract |
The present invention discloses a method and apparatus for producing highnsurface area material films and membranes on substrates. In one application,npatterns of spikes or bristles (12) are produced on wafers (10) and transferred tonfilms (20), such as conductive polymer or metal films, by using repetitive andninexpensive processes, such as electroplating and embossing. Such antechnique provides low cost, high surface area materials and allows reuse ofnexpensive patterned silicon. Membranes with high surface area (22) arenextremely valuable in fuel cells since the power density is generally proportionalnto the surface area and the patterns may be used to cast inexpensive fuel cellnelectrodes. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016034187-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2869599-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006041212-A1 |
| priorityDate |
2002-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |