| abstract |
A sputtering target that comprises an oxide containing indium, tin, zinc, and at least one element (X) selected from group X, with the atomic ratios between said elements satisfying relations (1) through (4). Group X: magnesium, silicon, aluminum, scandium, titanium, yttrium, zirconium, hafnium, tantalum, lanthanum, neodymium, and samarium (1) 0.10 ≤ In/(In+Sn+Zn) ≤ 0.85 (2) 0.01 ≤ Sn/(In+Sn+Zn) ≤ 0.40 (3) 0.10 ≤ Zn/(In+Sn+Zn) ≤ 0.70 (4) 0.70 ≤ In/(In+X) ≤ 0.99 (In these relations, In, Sn, Zn, and X represent the atomic ratios of indium, tin, zinc, and element X in the sputtering target, respectively.) |