| abstract |
The present invention provides: an alkali-developable and negative-type photosensitive resin composition which exhibits excellent transparency, chemical resistance, heat resistance and alkali developability and which exhibits excellent heat resistance and long-term deterioration resistance requisite for a permanent resist and is suitable as an insulating layer; and a permanent resist using the photosensitive resin composition. Specifically, the present invention provides a photosensitive resin composition which comprises both a polysiloxane compound obtained by hydrolytic condensation among a specific unsaturated silane compound, a specific silane compound and a specific cyclic siloxane compound, and a photo radical generator. |