| abstract |
Provided is a photosensitive resin composition which is excellent in chemical resistance and electrical insulation, and which can obtain a cured relief pattern having a cross-sectional shape of a net taper after curing. (A) and (meth) acrylic group-containing compound (B) comprising at least one member selected from the group consisting of polyimide and its precursor, polybenzoxazole and a precursor thereof, (Meth) acrylic group-containing compound (B) is at least one compound selected from the group consisting of a structure represented by the general formula (1) and one kind selected from the general formulas (2-1), (2-2) (B1) which is a condensate of a compound having the above structure and has a plurality of structures of the general formula (1), wherein the compound (B1) has a weight average molecular weight of 1,000 to 5,000, 20,000. ≪ / RTI > (1), R 1 represents a hydrogen atom or a methyl group, m represents an integer in the range of 1 m 4, an asterisk indicates a linking moiety, and the general formula (2-1) (2-2 ) And (2-3), R 2 represents a methyl group or an ethyl group, n represents an integer within the range of 1? N? 4, and * represents a bonded portion) |