| abstract |
The present invention provides a negative photosensitive resin composition, an electronic device, and a polymer that are excellent in balance between resolution and time required for pattern formation. A polymer containing a repeating unit represented by the following (1) and (2a), wherein R 5 in the formula (2a) has a radically polymerizable group and is an organic group having 2 to 18 carbon atoms: A negative photosensitive resin composition containing a radical photopolymerization initiator is provided. (In formula (1), R 1 , R 2 , R 3 and R 4 are each independently hydrogen or an organic group having 1 to 30 carbon atoms. N is 0, 1 or 2) [Selection figure] None |