| abstract |
Disclosed is a composition for etching a ruthenium-based metal, which is obtained by adding and mixing at least a bromine-containing compound, an oxidizing agent, a basic compound and water, and has a pH of 10 or more but less than 12. The added amount of the bromine-containing compound is 2-25% by mass in terms of bromine element and the added amount of the oxidizing agent is 0.1-12% by mass, respectively relative to the total mass. The composition is capable of effectively etching a ruthenium-based metal. |