| abstract |
A processing liquid for semiconductor wafers used in a semiconductor formation process, etc. are provided. (A) Hypochlorite ion, (B) The processing liquid etc. containing the alkylammonium salt represented by following formula (1) are provided. (Wherein, a is an integer of 6 to 20, and R 1 , R 2 , and R 3 are independently, for example, an alkyl group having 1 to 20 carbon atoms. X − is, for example, a chloride ion. ) |