Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a542402965408c0b2fe514a0154eb874 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8c6eaa878ad99b84378735251232326e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
filingDate |
2002-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5321f427fdcc331d3bde201f5ee9fa92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c77c05ec4c2f6950b9f56a6c2dbad41 |
publicationDate |
2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-03054247-A2 |
titleOfInvention |
Cleaning gas composition for semiconductor production equipment and cleaning method using the gas |
abstract |
The present invention provides a cleaning gas for semiconductor or equipment for producing semiconductor or liquid crystal, comprising a fluorine gas containing 1 vol % or less of oxygen and/or oxygen-containing compound. The cleaning gas of the present invention enables an efficient production process of semiconductor device with a high etching rate to improve the cleaning efficiency which ensures excellent cost performance. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627180-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7581549-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011041223-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100393913-C http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2522662-C2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1932941-A1 |
priorityDate |
2001-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |