| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T279-23 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23Q3-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
1999-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9759a58d1f11d91f72772f86db16de96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90dc8aa7096652ce8b306c24c91c5806 |
| publicationDate |
2000-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0019519-A1 |
| titleOfInvention |
Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors |
| abstract |
A glass workpiece processed in a vacuum plasma processing chamber is dechucked from a monopolar electrostatic chuck by gradually reducing the chucking voltage during processing while maintaining the voltage high enough to clamp the workpiece. The chucking voltage during processing is controlled in response to flow rate of a heat transfer fluid flowing to the chuck to maintain the chucking force and the flow rate approximately constant. A reverse polarity voltage applied to the chuck at the end of processing assists in dechucking. The workpiece temperature is maintained at a high value at the end of processing to assisting in dechucking. Peak current flowing through the chuck during workpiece lifting from the chuck controls the amplitude and/or duration of the reverse polarity voltage during the next dechucking operation. An inert plasma in the chamber removes residual charge from the workpiece after workpiece lifting from the chuck. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8608852-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1118425-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1118425-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013137932-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9721821-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10395963-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9639097-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9214315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1156522-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7042697-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10274270-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015123108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10928145-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011156240-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9338871-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011156240-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10854425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0217384-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014105883-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916793-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011156239-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011156239-A3 |
| priorityDate |
1998-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |