| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96056afea4ebb9762bfa12db4af32e72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_437d14690895e9f410586b0516cdee8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52798d1405eb9fd30378c34b597661a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c39c00bef86fa9981d10fbafeff8bd22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0680cbd6529ed20f88e1984ec07accca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84922a1b9b7ed3a4d9c896e2834e4df7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdbcf172381e05d434a67ea3578713fd |
| publicationDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9528183-B2 |
| titleOfInvention |
Cobalt removal for chamber clean or pre-clean process |
| abstract |
Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate processing chamber. In one implementation, a method for removing cobalt or cobalt containing deposits from one or more interior surfaces of a substrate processing chamber after processing a substrate disposed in the substrate processing chamber is provided. The method comprises forming a reactive species from the fluorine containing cleaning gas mixture, permitting the reactive species to react with the cobalt and/or the cobalt containing deposits to form cobalt fluoride in a gaseous state and purging the cobalt fluoride in gaseous state out of the substrate processing chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10600624-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10312076-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11121002-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11682560-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11361939-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11532462-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11062887-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021067362-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11276559-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11049755-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11101136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264213-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11437242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11158527-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11735441-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10636628-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11328909-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11276590-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11476093-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11594428-B2 |
| priorityDate |
2013-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |