| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C321-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 |
| filingDate |
2014-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdae697df2ea8f34a395e20f6b520a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3811d3b7ff94e8a62cc77825a3b15a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47444ed2c5a58d0565bf04697bba0171 |
| publicationDate |
2016-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9523911-B2 |
| titleOfInvention |
Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound |
| abstract |
The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO 3 − , wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to SO 3 − , and an electron-withdrawing group bonds to a β carbon atom with respect to SO 3 − ; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R 1 and R 2 each independently represent a hydrogen atom or a monovalent electron-donating group. R 3 represent a monovalent electron-withdrawing group. R 4 represents a hydrogen atom or a monovalent hydrocarbon group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017038679-A1 |
| priorityDate |
2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |