http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9447496-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46bb1ed5f069cdd5ae1ef58e95b70952 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4473696514c216d16d49ae909cff0372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e7daf3ae0b60f3dd5461f465fdc6dadd |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2012-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f1d55b79c43097e8a38b18c0add8d8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84a50444d70475aef8f431182a3a67f8 |
| publicationDate | 2016-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-9447496-B2 |
| titleOfInvention | Nanolayer deposition process |
| abstract | A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of precursors to deposit a thin film and introducing a second plurality of precursors to modify the deposited thin film. The deposition using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film, including treatments such as modification of film composition and doping or removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9708707-B2 |
| priorityDate | 2003-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 100.