| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3452 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32688
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-465 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 |
| filingDate |
2013-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_edba2985116680de99095858a5d4b080
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03bd1fe7feec95c23e8c70af52a846d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fa10bd8b7c0261dc2b5f88f7d65bfbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9acf079327f1e2490742e727a5a738a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d93100d28f675ede5d62723e38940b6f |
| publicationDate |
2016-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9390943-B2 |
| titleOfInvention |
Substrate processing apparatus |
| abstract |
A substrate processing apparatus generates an electric field in a processing space between a lower electrode to which a high frequency power is supplied and an upper electrode facing the lower electrode and performs plasma processing on a substrate mounted on the lower electrode by using a plasma generated by the electric field. Distribution of a plasma density in the processing space is controlled by a magnetic field generated by controlling a plurality of electromagnets provided at a top surface of the upper electrode which is provided to be opposite to the processing space. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11346896-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11662397-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022236341-A1 |
| priorityDate |
2012-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |