| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0672
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D161-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G12-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-02 |
| filingDate |
2012-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88aa49faad4cf70318f887946d799b49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a2cf3f9243b10468d4363d9faa4776a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c3da48141cf33839cfbc6b5598dbc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9263286-B2 |
| titleOfInvention |
Diarylamine novolac resin |
| abstract |
A novel diarylamine novolac resin such as a phenylnaphthylamine novolac resin, and further a resist underlayer film-forming composition in which the resin is used in a lithography process for manufacturing a semiconductor device. A polymer including a unit structure (A) of Formula (1): n n(in Formula (1), each of Ar 1 and Ar 2 is a benzene ring or a naphthalene ring). A method for manufacturing a semiconductor device, including: forming an underlayer film on a semiconductor substrate with the resist underlayer film-forming composition; forming a hardmask on the underlayer film; forming a resist film on the hardmask; forming a resist pattern by irradiation with light or an electron beam followed by development; etching the hardmask with the resist pattern; etching the underlayer film with the hardmask thus patterned; and processing the semiconductor substrate with the underlayer film thus patterned. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11567408-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11506980-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018314154-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017097568-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11339242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11650505-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019225731-A1 |
| priorityDate |
2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |