| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6af9a57049d2d91c036d4f5ab49154cb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823456
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7833 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-772
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0922
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0928
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4958
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-82345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42364
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8797a93dda86c98889981d74eef92a40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1703684790545ea44ae4ab0e0fba95b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54efd071b18a1d169e0b5d070066626 |
| publicationDate |
2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9190488-B1 |
| titleOfInvention |
Methods of forming gate structure of semiconductor devices and the resulting devices |
| abstract |
One method disclosed includes forming a replacement gate structure for a device. The method includes forming a gate cavity above a semiconductor substrate. The method further includes forming a first bulk metal layer in the gate cavity above a work function metal layer. The method further includes forming a conductive etch stop layer in the gate cavity above the first bulk metal layer. The method further includes forming a second bulk metal layer in the gate cavity above the conductive etch stop layer. The method further includes performing at least one etching process to recess the first and second bulk metal layers selectively relative to the conductive etch stop layer. The method further includes performing at least one etching process to recess at least the conductive etch stop layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10354928-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10325824-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018315754-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9698232-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10050149-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10056303-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108573922-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9899264-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108573922-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018012806-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10622353-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016276455-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10242982-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9583400-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016322473-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018261595-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10163718-B2 |
| priorityDate |
2014-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |