| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_336ae16dbea3a5602fd9689ea8a9a448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30465b15960b57bbcc2a303eefbf55fb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0195 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-284
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-14 |
| filingDate |
2012-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9fdb2026d5b66f872bd92c82911231d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2ae2bbb0bd5c4768c65c6cc64ffaf63 |
| publicationDate |
2015-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8962097-B1 |
| titleOfInvention |
Surface properties of polymeric materials with nanoscale functional coating |
| abstract |
A film deposition process comprising exposing a surface of a substrate to a first plasma treatment having plasma reactants in a plasma chamber to form an activated substrate surface. The activated surface has a lower water contact angle than the substrate surface before the surface activating. The process comprises introducing water vapor into the plasma chamber to form a water layer on the activated surface. The process comprises introducing pre-cursors molecules into the plasma chamber in the presence of a second plasma to graft a layer of reacted pre-cursor molecules on the water layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019092916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11130941-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019198330-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11227770-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111197176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111197176-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11248100-B2 |
| priorityDate |
2007-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |