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filingDate 2012-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8889546-B2
titleOfInvention Discontinuous/non-uniform metal cap structure and process for interconnect integration
abstract A method of fabricating an interconnect structure is provided which includes providing a dielectric material having a dielectric constant of about 3.0 or less and at least one conductive material embedded therein, the at least one conductive material has an upper surface that is coplanar with an upper surface of the dielectric material; and forming a noble metal-containing cap directly on the upper surface of the at least one conductive material, wherein the noble metal cap is discontinuous or non-uniform.
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